This site gives you an overview of my research work which is devoted to materials science. This discipline is concerned with the preparation and adaption of functional materials to various high-technology devices like solar cells, protective coatings, biomolecular sensors or numerous other applications.
An important role in materials sciences is played by thin films. These are both fascinating objects in modern science and essential ingredients to our technological way of life. By "thin" film a thickness between 0.000001 and 0.01 mm is meant (1 nm to 10 µm). Some applications are the aluminium layer on potato chip wrappings, the antireflection coating on eyeglass lenses or the highly complex stacks of semiconductors, insulators and metals that make computers and handys/cellulars going. What makes the field so exciting is that many future technology applications rely on new thin film systems that still have to be developed: more information.
 My research work has mainly been dealt with the structure and growth of thin films, the investigation of which was performed by x-ray diffraction and other structure sensitive techniques. More details can be found in the monograph:
Thin Film Analysis by X-ray Scattering
Mario Birkholz
with contributions by Paul F. Fewster & Christoph Genzel,
356 pages, Wiley-VCH, Weinheim (2006)
including 101 Exercises and Solutions.
Please, note the forthcoming symposium X-ray Techniques for Materials Research - from Laboratory Sources to Free Electron Lasers
(symposium M) to be held at the 2011 spring meeting of the
European Materials Research Society (E-MRS)
from May 9-13, 2011, in Nice, France. Symposium organizers:
F. Boscherini, M. Birkholz, J.-Y. Buffière, D. Chateigner and P. F. Fewster.
 Previously published
X-ray Techniques for Advanced Materials, Nanostructures and Thin Films:
from Laboratory Sources to Synchrotron Radiation
Proceedings of EMRS 2009 Spring Meeting - Symposium R
Strasbourg, France, June 8-June 12 2009
Nuclear Instruments and Methods in Physics Research B
Beam Interactions with Materials and Atoms
Vol. 268, Issue 3-4
Guest Editors:
F. Boscherini, M. Birkholz, J.-Y. Buffière, D. Chateigner, P. F. Fewster, S. Heun
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